Developments in Surface Contamination and Cleaning, Vol. 1
-10%
portes grátis
Developments in Surface Contamination and Cleaning, Vol. 1
Fundamentals and Applied Aspects
Mittal, Kashmiri L.; Kohli, Rajiv
William Andrew Publishing
11/2015
894
Dura
Inglês
9780323299602
15 a 20 dias
1560
Descrição não disponível.
Part 1 Fundamentals
1. The Physical Nature of Very, Very Small Particles and its Impact on their Behaviour
2. Transport and Deposition of Aerosol Particles
3. Relevance of Particle Transport in Surface Deposition and Cleaning
4. Aspects of Particle Adhesion and Removal
5. Tribological Implications of Particles
6. ESD Controls in Cleanroom Environments: Relevance to Particle Deposition
7. Airborne Molecular Contamination: Contamination on Substrates and Environments in Semiconductors and Other Industries
Part 2 Characterization
8. Surface Analysis Methods for Contaminant Identification
9. Electron Microscopy Techniques for Imaging and Analysis of Nanoparticles
10. Wettability Techniques to Monitor the Cleanliness of Surfaces
Part 3 Techniques for Removal of Surface Contamination
11. Cleaning with Solvents Durkee Reprint
12. Removal of Particles by Chemical Cleaning
13. The Use of Surfactants to Enhance Particle Removal from Surfaces
14. Microabrasive Precision Cleaning and Processing Technology
15. Cleaning Using High-Speed Impinging Jet
16. Carbon Dioxide Snow Cleaning Sherman Update
17. Cleaning Using Argon/Nitrogen Cryogenic Aerosols
18. Coatings for Preventing or Deactivation of Biological Contaminants
19. A Detailed Study of Semiconductor Wafer Drying
1. The Physical Nature of Very, Very Small Particles and its Impact on their Behaviour
2. Transport and Deposition of Aerosol Particles
3. Relevance of Particle Transport in Surface Deposition and Cleaning
4. Aspects of Particle Adhesion and Removal
5. Tribological Implications of Particles
6. ESD Controls in Cleanroom Environments: Relevance to Particle Deposition
7. Airborne Molecular Contamination: Contamination on Substrates and Environments in Semiconductors and Other Industries
Part 2 Characterization
8. Surface Analysis Methods for Contaminant Identification
9. Electron Microscopy Techniques for Imaging and Analysis of Nanoparticles
10. Wettability Techniques to Monitor the Cleanliness of Surfaces
Part 3 Techniques for Removal of Surface Contamination
11. Cleaning with Solvents Durkee Reprint
12. Removal of Particles by Chemical Cleaning
13. The Use of Surfactants to Enhance Particle Removal from Surfaces
14. Microabrasive Precision Cleaning and Processing Technology
15. Cleaning Using High-Speed Impinging Jet
16. Carbon Dioxide Snow Cleaning Sherman Update
17. Cleaning Using Argon/Nitrogen Cryogenic Aerosols
18. Coatings for Preventing or Deactivation of Biological Contaminants
19. A Detailed Study of Semiconductor Wafer Drying
Este título pertence ao(s) assunto(s) indicados(s). Para ver outros títulos clique no assunto desejado.
Cleaning; contamination; microscale; particles
Part 1 Fundamentals
1. The Physical Nature of Very, Very Small Particles and its Impact on their Behaviour
2. Transport and Deposition of Aerosol Particles
3. Relevance of Particle Transport in Surface Deposition and Cleaning
4. Aspects of Particle Adhesion and Removal
5. Tribological Implications of Particles
6. ESD Controls in Cleanroom Environments: Relevance to Particle Deposition
7. Airborne Molecular Contamination: Contamination on Substrates and Environments in Semiconductors and Other Industries
Part 2 Characterization
8. Surface Analysis Methods for Contaminant Identification
9. Electron Microscopy Techniques for Imaging and Analysis of Nanoparticles
10. Wettability Techniques to Monitor the Cleanliness of Surfaces
Part 3 Techniques for Removal of Surface Contamination
11. Cleaning with Solvents Durkee Reprint
12. Removal of Particles by Chemical Cleaning
13. The Use of Surfactants to Enhance Particle Removal from Surfaces
14. Microabrasive Precision Cleaning and Processing Technology
15. Cleaning Using High-Speed Impinging Jet
16. Carbon Dioxide Snow Cleaning Sherman Update
17. Cleaning Using Argon/Nitrogen Cryogenic Aerosols
18. Coatings for Preventing or Deactivation of Biological Contaminants
19. A Detailed Study of Semiconductor Wafer Drying
1. The Physical Nature of Very, Very Small Particles and its Impact on their Behaviour
2. Transport and Deposition of Aerosol Particles
3. Relevance of Particle Transport in Surface Deposition and Cleaning
4. Aspects of Particle Adhesion and Removal
5. Tribological Implications of Particles
6. ESD Controls in Cleanroom Environments: Relevance to Particle Deposition
7. Airborne Molecular Contamination: Contamination on Substrates and Environments in Semiconductors and Other Industries
Part 2 Characterization
8. Surface Analysis Methods for Contaminant Identification
9. Electron Microscopy Techniques for Imaging and Analysis of Nanoparticles
10. Wettability Techniques to Monitor the Cleanliness of Surfaces
Part 3 Techniques for Removal of Surface Contamination
11. Cleaning with Solvents Durkee Reprint
12. Removal of Particles by Chemical Cleaning
13. The Use of Surfactants to Enhance Particle Removal from Surfaces
14. Microabrasive Precision Cleaning and Processing Technology
15. Cleaning Using High-Speed Impinging Jet
16. Carbon Dioxide Snow Cleaning Sherman Update
17. Cleaning Using Argon/Nitrogen Cryogenic Aerosols
18. Coatings for Preventing or Deactivation of Biological Contaminants
19. A Detailed Study of Semiconductor Wafer Drying
Este título pertence ao(s) assunto(s) indicados(s). Para ver outros títulos clique no assunto desejado.