Developments in Surface Contamination and Cleaning, Vol. 1

Developments in Surface Contamination and Cleaning, Vol. 1

Fundamentals and Applied Aspects

Mittal, Kashmiri L.; Kohli, Rajiv

William Andrew Publishing

11/2015

894

Dura

Inglês

9780323299602

15 a 20 dias

1560

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Part 1 Fundamentals
1. The Physical Nature of Very, Very Small Particles and its Impact on their Behaviour
2. Transport and Deposition of Aerosol Particles
3. Relevance of Particle Transport in Surface Deposition and Cleaning
4. Aspects of Particle Adhesion and Removal
5. Tribological Implications of Particles
6. ESD Controls in Cleanroom Environments: Relevance to Particle Deposition
7. Airborne Molecular Contamination: Contamination on Substrates and Environments in Semiconductors and Other Industries

Part 2 Characterization
8. Surface Analysis Methods for Contaminant Identification
9. Electron Microscopy Techniques for Imaging and Analysis of Nanoparticles
10. Wettability Techniques to Monitor the Cleanliness of Surfaces

Part 3 Techniques for Removal of Surface Contamination
11. Cleaning with Solvents Durkee Reprint
12. Removal of Particles by Chemical Cleaning
13. The Use of Surfactants to Enhance Particle Removal from Surfaces
14. Microabrasive Precision Cleaning and Processing Technology
15. Cleaning Using High-Speed Impinging Jet
16. Carbon Dioxide Snow Cleaning Sherman Update
17. Cleaning Using Argon/Nitrogen Cryogenic Aerosols
18. Coatings for Preventing or Deactivation of Biological Contaminants
19. A Detailed Study of Semiconductor Wafer Drying
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Cleaning; contamination; microscale; particles